Friday, September 4, 2009

Problem stsetch SNF 2009-09-04 20:11:02: silicon:oxide selectivity is still bad

I did two etches today. I confirm that oxide etch rate is too fast and silicon etch rate is too slow. I need SNF to experiment with the butterfly valve setting so that the processing pressure is selected correctly for this powerful turbo pump - if this is the reason for the problem that I see. For now I have released my process time.

No comments: