DEEP 00:10:00
Si ER =1.71um/min
PR ER = 185A/min
Si : PR Sel = 92 : 1
Etch rates have decreased significantly.
Observed the already repoted He pressure oscillations from 2.4 to 3.0. He flow steady at 5.1
Also got error 'IPC not available' at the end of the etch, twice.
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